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Electrochemical Atomic Layer Deposition of CuInSe2 on Au Surface

Authors
Jung, Chan-YongRamasamy, MukunthanYeon, Yu-BeomLee, Chi-Woo
Issue Date
Oct-2019
Publisher
WILEY-V C H VERLAG GMBH
Keywords
Chalcopyrite; Electrochemical atomic layer deposition; Underpotential deposition; Photoelectrochemistry
Citation
BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.40, no.10, pp 963 - 970
Pages
8
Indexed
SCI
SCIE
SCOPUS
KCI
Journal Title
BULLETIN OF THE KOREAN CHEMICAL SOCIETY
Volume
40
Number
10
Start Page
963
End Page
970
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/62645
DOI
10.1002/bkcs.11854
ISSN
0253-2964
1229-5949
Abstract
CuInSe2 (CIS) thin film growth on Au/glass slide surface was investigated by electrochemical atomic layer deposition (E-ALD) in superlattice sequence in ambient laboratory conditions without any heat treatment processes involved. The electrochemical behavior of Cu, In, and Se on the Au surface was surveyed, the underpotential deposition phenomena of In was demonstrated for the first time and a various set of potentials for the three elements were considered to fabricate thin CIS films by specific superlattice sequencing. The crystal structure, elemental composition, topography, and photoelectrochemical behavior of each film produced were evaluated with the aim of finding a new set of conditions for producing stoichiometric CIS films. A good stoichiometric film of Cu0.99In0.98Se2.00 was successfully prepared by applying 50 periods of the superlattice sequence of 3(InaSeb) + 1(CucSed) with the new deposition potentials of 0.08, -0.55, and -0.05 V for Cu, In, and Se precursor solutions, respectively. The resulting E-ALD film was found to exhibit a p-type semiconductivity.
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