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Optimization of structured illumination microscopy with designing and rotating a grid pattern using a spatial light modulator

Authors
Han, Jeong-HeonYoo, Nak-WonKang, Ji-HoonJu, Byeong-KwonPark, Min-Chul
Issue Date
Sep-2019
Publisher
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Keywords
structured illumination microscopy; optimization; optical sectioning; spatial light modulator; three-dimensional measurement
Citation
OPTICAL ENGINEERING, v.58, no.9
Indexed
SCIE
SCOPUS
Journal Title
OPTICAL ENGINEERING
Volume
58
Number
9
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/63420
DOI
10.1117/1.OE.58.9.094102
ISSN
0091-3286
Abstract
Our structured illumination microscopy (SIM) is based on a spatial light modulator (SLM) instead of an illumination mask, which does not need to be attached to a linear stage. This SIM can easily design the period of the one-dimensional grid related to the optical sectioning strength and can rapidly acquire three-dimensional data. The optimization of SIM with an SLM is proposed. Previous studies primarily varied magnification with a high numerical aperture objective to optimize the axial response. It is feasible to obtain the maximum optical sectioning strength by designing a grid pattern that has an appropriately high spatial frequency and to uniformly cover the entire frequency spectrum of the sample by rotating a grid pattern. We have successfully optimized SIM with such a grid and covered the frequency spectrum by rotating a grid pattern in multiple orientations. (C) The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License.
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