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Graphoepitaxial Assembly of Block Copolymer for Bending Stripe Patterns
- Authors
- Huh, June; Kim, Mi-Jeong; Park, Jong-Wan
- Issue Date
- 7월-2019
- Publisher
- WILEY-V C H VERLAG GMBH
- Keywords
- block copolymer; directed self-assembly; monte carlo simulation; nanopatterning
- Citation
- MACROMOLECULAR THEORY AND SIMULATIONS, v.28, no.4
- Indexed
- SCIE
SCOPUS
- Journal Title
- MACROMOLECULAR THEORY AND SIMULATIONS
- Volume
- 28
- Number
- 4
- ISSN
- 1022-1344
- Abstract
- The formation of bend patterns using block copolymer (BCP) lamellae within trench-type groove patterned with bend geometry is simulated by using a Monte Carlo simulation and a strong segregation theory. A tolerance of curvatures at the bend corners of the guide pattern for the formation of bent lamellae is proposed. It is found from the simulation and the strong segregation theory that the tolerance for the difference in curvature radii of two bend corners for the well-patterned lamellar bends is proportional to the inverse of the trench width in the straight region.
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