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Covered Source-Channel Tunnel Field-Effect Transistors With Trench Gate Structures

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dc.contributor.authorWoo, Sola-
dc.contributor.authorKim, Sangsig-
dc.date.accessioned2021-09-01T22:54:47Z-
dc.date.available2021-09-01T22:54:47Z-
dc.date.created2021-06-18-
dc.date.issued2019-
dc.identifier.issn1536-125X-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/69021-
dc.description.abstractWe propose a new design for covered source-channel tunnel field-effect transistors (CSC-TFETs) with trench gate structures. The I-V characteristics, ON/OFF current ratio, subthreshold swing, and band-to-band tunneling rate are analyzed using a commercial device simulator. Our proposed CSC-TFETs exhibit an ON/OFF current ratio of approximately 10(10), an ON-current of approximately 10(-5) A/mu m at room temperature, and a subthreshold swing of less than 40 mV/decade. In addition, the ON-current of the CSC-TFETs is similar to 233 times that of conventional TFETs, demonstrating that the switching characteristics are superior to those of other silicon-based TFETs. Moreover, a CSC-TFET inverter is characterized by SPICE calibration and provides a high frequency of approximately 1 GHz at a supply voltage of 1.0 V.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectSTRAINED SI-
dc.subjectFETS-
dc.subjectLOGIC-
dc.subjectDESIGN-
dc.titleCovered Source-Channel Tunnel Field-Effect Transistors With Trench Gate Structures-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Sangsig-
dc.identifier.doi10.1109/TNANO.2018.2882859-
dc.identifier.scopusid2-s2.0-85057808500-
dc.identifier.wosid000455709300012-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON NANOTECHNOLOGY, v.18, pp.114 - 118-
dc.relation.isPartOfIEEE TRANSACTIONS ON NANOTECHNOLOGY-
dc.citation.titleIEEE TRANSACTIONS ON NANOTECHNOLOGY-
dc.citation.volume18-
dc.citation.startPage114-
dc.citation.endPage118-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSTRAINED SI-
dc.subject.keywordPlusFETS-
dc.subject.keywordPlusLOGIC-
dc.subject.keywordPlusDESIGN-
dc.subject.keywordAuthorTunnel field-effect transistors-
dc.subject.keywordAuthorTCAD simulation-
dc.subject.keywordAuthorSPICE model-
dc.subject.keywordAuthorcovered source-channel TFET-
dc.subject.keywordAuthortrench gate-
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