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Effects on Magnetic Properties of GaMnAs Induced by Proximity of Topological Insulator Bi2Se3

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dc.contributor.authorBac, Seul-Ki-
dc.contributor.authorLee, Hakjoon-
dc.contributor.authorLee, Sangyeop-
dc.contributor.authorChoi, Seonghoon-
dc.contributor.authorLee, Sanghoon-
dc.contributor.authorLiu, X.-
dc.contributor.authorDobrowolska, M.-
dc.contributor.authorFurdyna, J. K.-
dc.date.accessioned2021-09-02T08:41:47Z-
dc.date.available2021-09-02T08:41:47Z-
dc.date.created2021-06-16-
dc.date.issued2018-08-
dc.identifier.issn0361-5235-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/74272-
dc.description.abstractEffects induced by a topological insulator Bi2Se3 on the magnetic properties of an adjacent GaMnAs film have been investigated using transport measurements. We observed three conspicuous effects in the GaMnAs layer induced by the proximity of the Bi2Se3 overlayer. First, our resistivity data as a function of temperature show that the GaMnAs layer adjacent to the Bi2Se3 displayed strongly metallic behavior, as compared with the GaMnAs control specimen. Second, the Curie temperature of the GaMnAs in the bilayer was observed to be higher than that of the control layer, in our case by nearly a factor of two. Finally, we observed significant changes in the in-plane magnetic anisotropy of the GaMnAs in the bilayer, in the form of much higher values of both cubic and uniaxial anisotropy parameters. This latter feature manifests itself in a rather spectacular increase of the coercive field observed in magnetization reversal across the in-plane hard axis. These results suggest that proximity of an adjacent Bi2Se3 layer represents an important tool for modifying and controlling the ferromagnetic properties of GaMnAs film, and could thus be used to optimize this and similar materials for applications in spintronic devices.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherSPRINGER-
dc.subjectSURFACE-
dc.titleEffects on Magnetic Properties of GaMnAs Induced by Proximity of Topological Insulator Bi2Se3-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Sanghoon-
dc.identifier.doi10.1007/s11664-018-6238-1-
dc.identifier.scopusid2-s2.0-85044725949-
dc.identifier.wosid000437146400016-
dc.identifier.bibliographicCitationJOURNAL OF ELECTRONIC MATERIALS, v.47, no.8, pp.4308 - 4313-
dc.relation.isPartOfJOURNAL OF ELECTRONIC MATERIALS-
dc.citation.titleJOURNAL OF ELECTRONIC MATERIALS-
dc.citation.volume47-
dc.citation.number8-
dc.citation.startPage4308-
dc.citation.endPage4313-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordAuthorFerromagnetic semiconductors-
dc.subject.keywordAuthortopological insulator-
dc.subject.keywordAuthorproximity effects-
dc.subject.keywordAuthoranomalous Hall effect-
dc.subject.keywordAuthorplanar Hall effects-
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