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Refractive Index Tunable Nanoporous SiO2 Thin Film and Its Application to Mechanically Robust Broadband Anti-Reflection

Authors
Huh, DaihongChoi, Hak-JongKim, KwanPark, JaeminLee, Heon
Issue Date
8월-2018
Publisher
AMER SCIENTIFIC PUBLISHERS
Keywords
Refractive Index; Moth-Eye; Nanoporous; Direct Printing; Anti-Reflection
Citation
NANOSCIENCE AND NANOTECHNOLOGY LETTERS, v.10, no.8, pp.1101 - 1106
Indexed
SCIE
Journal Title
NANOSCIENCE AND NANOTECHNOLOGY LETTERS
Volume
10
Number
8
Start Page
1101
End Page
1106
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/74287
DOI
10.1166/nnl.2018.2755
ISSN
1941-4900
Abstract
In this study, we demonstrate refractive index tunable nanoporous SiO2 thin film and it applied to moth-eye patterned substrate to improve the mechanical properties. Here, we successfully developed a simple fabrication method for the nanoporous SiO2 thin-film with ZnO-SiO2 nanoparticles mixed solution coating and ZnO wet-etching process which has a value lower than 1.35. In addition, a moth-eye structure was easily fabricated using a direct printing method, which has some merits for simplicity, cost-effectiveness and mass production. Then, we combined the nanoporous SiO2 thin film on the moth-eye-structured glass to achieve mechanical robustness and broadband anti-reflection, with the film having a transmittance of over 95% and a pencil hardness of 8H.
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공과대학 (신소재공학부)
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