Refractive Index Tunable Nanoporous SiO2 Thin Film and Its Application to Mechanically Robust Broadband Anti-Reflection
- Authors
- Huh, Daihong; Choi, Hak-Jong; Kim, Kwan; Park, Jaemin; Lee, Heon
- Issue Date
- 8월-2018
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- Refractive Index; Moth-Eye; Nanoporous; Direct Printing; Anti-Reflection
- Citation
- NANOSCIENCE AND NANOTECHNOLOGY LETTERS, v.10, no.8, pp.1101 - 1106
- Indexed
- SCIE
- Journal Title
- NANOSCIENCE AND NANOTECHNOLOGY LETTERS
- Volume
- 10
- Number
- 8
- Start Page
- 1101
- End Page
- 1106
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/74287
- DOI
- 10.1166/nnl.2018.2755
- ISSN
- 1941-4900
- Abstract
- In this study, we demonstrate refractive index tunable nanoporous SiO2 thin film and it applied to moth-eye patterned substrate to improve the mechanical properties. Here, we successfully developed a simple fabrication method for the nanoporous SiO2 thin-film with ZnO-SiO2 nanoparticles mixed solution coating and ZnO wet-etching process which has a value lower than 1.35. In addition, a moth-eye structure was easily fabricated using a direct printing method, which has some merits for simplicity, cost-effectiveness and mass production. Then, we combined the nanoporous SiO2 thin film on the moth-eye-structured glass to achieve mechanical robustness and broadband anti-reflection, with the film having a transmittance of over 95% and a pencil hardness of 8H.
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Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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