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Inhomogeneity of barrier heights of transparent Ag/ITO Schottky contacts on n-type GaN annealed at different temperatures

Authors
Yoon, Su-JungLee, JeeyunSeong, Tae-Yeon
Issue Date
25-4월-2018
Publisher
ELSEVIER SCIENCE SA
Keywords
Ag/ITO; Transparency; Schottky barrier; Ga vacancy; X-ray photoemission spectroscopy
Citation
JOURNAL OF ALLOYS AND COMPOUNDS, v.742, pp.66 - 71
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF ALLOYS AND COMPOUNDS
Volume
742
Start Page
66
End Page
71
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/76095
DOI
10.1016/j.jallcom.2018.01.265
ISSN
0925-8388
Abstract
We report on the formation of high barrier-height and transparent Ag/ITO Schottky contacts on n-GaN (n(d) = 5 x 10(18) cm(-3)) for optoelectronic and transparent electronic devices. Calculations using the thermionic emission model-based current-voltage characteristics of the samples annealed at various temperatures showed small Schottky barrier heights (SBHs) of 0.31-0.37 eV and ideality factors of 1.84-2.19. Conventional activation energy plot showed greatly smaller Richardson constant than the theoretical value. To understand such abnormality, the modified Richardson plot, a model of lateral SBH variation with Gaussian distribution, and capacitance-voltage method were used, where their SBHs were estimated to be in the range 0.74-0.93 eV. Together with the temperature-dependent SBHs and ideality factors, these results imply that SBH behavior could be explained in terms of barrier inhomogeneity at the interfaces. The Ag/ITO samples annealed at 500 degrees C transmitted 80.9% at 560 nm. The X-ray photo-emission spectroscopy (XPS) Ga 2p core level spectra from the interfaces of the samples shifted toward either higher or lower energies. Scanning transmission electron microscopy (STEM)-energy dispersive Xray spectroscopy mapping results revealed the outdiffusion of Ga atoms from n-GaN when annealed at 500 degrees C. Based on the electrical, XPS and STEM results, the annealing temperature dependence of the SBHs is described and discussed. (C) 2018 Elsevier B.V. All rights reserved.
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SEONG, TAE YEON
공과대학 (신소재공학부)
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