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Etching Mechanism of ZnO films using Inductively Coupled HBr/Ar Plasma
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kwon, Kwang-Ho | - |
| dc.date.accessioned | 2021-09-02T13:13:47Z | - |
| dc.date.available | 2021-09-02T13:13:47Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/76461 | - |
| dc.publisher | DPS 2008 | - |
| dc.title | Etching Mechanism of ZnO films using Inductively Coupled HBr/Ar Plasma | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Kwon, Kwang-Ho | - |
| dc.identifier.bibliographicCitation | 30th International Symposium on Dry Process | - |
| dc.relation.isPartOf | 30th International Symposium on Dry Process | - |
| dc.citation.title | 30th International Symposium on Dry Process | - |
| dc.citation.conferencePlace | JA | - |
| dc.citation.conferenceDate | 2008-11-26 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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