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High temperature isothermal oxidation behavior of NbSi2 coating at 1000-1450 degrees C
- Authors
- Choi, Young-Jun; Yoon, Jin-Kook; Kim, Gyeung-Ho; Yoon, Woo-Young; Doh, Jung-Man; Hong, Kyung-Tae
- Issue Date
- 12월-2017
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Keywords
- Intermetallics; SEM; TEM; XRD; Oxidation
- Citation
- CORROSION SCIENCE, v.129, pp.102 - 114
- Indexed
- SCIE
SCOPUS
- Journal Title
- CORROSION SCIENCE
- Volume
- 129
- Start Page
- 102
- End Page
- 114
- ISSN
- 0010-938X
- Abstract
- Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000-1450 degrees C. Oxidation rate of NbSi2 coating increased with temperature at 1000-1300 degrees C but opposite trend was observed at 1300-1450 degrees C. Maximum oxidation rate was obtained at 1300 degrees C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 degrees C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.
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