Optically Patternable Metamaterial Below Diffraction Limit
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Youngseop | - |
dc.contributor.author | Park, Sang-Gil | - |
dc.contributor.author | Yoo, SeokJae | - |
dc.contributor.author | Kang, Minhee | - |
dc.contributor.author | Jeon, Sang Chul | - |
dc.contributor.author | Kim, Young-Su | - |
dc.contributor.author | Park, Q-Han | - |
dc.contributor.author | Jeong, Ki-Hun | - |
dc.date.accessioned | 2021-09-03T05:08:08Z | - |
dc.date.available | 2021-09-03T05:08:08Z | - |
dc.date.created | 2021-06-16 | - |
dc.date.issued | 2017-06-07 | - |
dc.identifier.issn | 1944-8244 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/83153 | - |
dc.description.abstract | We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive, polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and, solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range; which enables the: surface plasmon excitation for the gear, photolithographic definition of minimum feature size of 70 nm (less than or similar to lambda/5) beyond the near-field-zone. This-new meta material provides anew class of photoresist for ultraviolet nanolithogrphy below the diffraction limit. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | NEGATIVE REFRACTION | - |
dc.subject | SILVER SUPERLENS | - |
dc.subject | INDEX | - |
dc.subject | FIELD | - |
dc.subject | REALIZATION | - |
dc.subject | HYPERLENS | - |
dc.title | Optically Patternable Metamaterial Below Diffraction Limit | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Yoo, SeokJae | - |
dc.contributor.affiliatedAuthor | Park, Q-Han | - |
dc.identifier.doi | 10.1021/acsami.7b02940 | - |
dc.identifier.scopusid | 2-s2.0-85020409680 | - |
dc.identifier.wosid | 000403136400002 | - |
dc.identifier.bibliographicCitation | ACS APPLIED MATERIALS & INTERFACES, v.9, no.22, pp.18405 - 18409 | - |
dc.relation.isPartOf | ACS APPLIED MATERIALS & INTERFACES | - |
dc.citation.title | ACS APPLIED MATERIALS & INTERFACES | - |
dc.citation.volume | 9 | - |
dc.citation.number | 22 | - |
dc.citation.startPage | 18405 | - |
dc.citation.endPage | 18409 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.subject.keywordPlus | NEGATIVE REFRACTION | - |
dc.subject.keywordPlus | SILVER SUPERLENS | - |
dc.subject.keywordPlus | INDEX | - |
dc.subject.keywordPlus | FIELD | - |
dc.subject.keywordPlus | REALIZATION | - |
dc.subject.keywordPlus | HYPERLENS | - |
dc.subject.keywordAuthor | meta-photoresist | - |
dc.subject.keywordAuthor | surface plasmon excitation | - |
dc.subject.keywordAuthor | superlens effect | - |
dc.subject.keywordAuthor | ultraviolet nanolithography | - |
dc.subject.keywordAuthor | subdiffraction limit | - |
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