Optically Patternable Metamaterial Below Diffraction Limit
- Authors
- Lee, Youngseop; Park, Sang-Gil; Yoo, SeokJae; Kang, Minhee; Jeon, Sang Chul; Kim, Young-Su; Park, Q-Han; Jeong, Ki-Hun
- Issue Date
- 7-6월-2017
- Publisher
- AMER CHEMICAL SOC
- Keywords
- meta-photoresist; surface plasmon excitation; superlens effect; ultraviolet nanolithography; subdiffraction limit
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.9, no.22, pp.18405 - 18409
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 9
- Number
- 22
- Start Page
- 18405
- End Page
- 18409
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/83153
- DOI
- 10.1021/acsami.7b02940
- ISSN
- 1944-8244
- Abstract
- We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive, polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and, solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range; which enables the: surface plasmon excitation for the gear, photolithographic definition of minimum feature size of 70 nm (less than or similar to lambda/5) beyond the near-field-zone. This-new meta material provides anew class of photoresist for ultraviolet nanolithogrphy below the diffraction limit.
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Collections - College of Science > Department of Physics > 1. Journal Articles
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