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Full range optical and electrical properties of Zn-doped SnO2 and oxide/metal/oxide multilayer thin films deposited on flexible PET substrate

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dc.contributor.authorCho, Yoonho-
dc.contributor.authorParmar, Narendra S.-
dc.contributor.authorNahm, Sahn-
dc.contributor.authorChoi, Ji-Won-
dc.date.accessioned2021-09-03T09:28:04Z-
dc.date.available2021-09-03T09:28:04Z-
dc.date.created2021-06-16-
dc.date.issued2017-02-15-
dc.identifier.issn0925-8388-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/84443-
dc.description.abstractAs a potential replacement of indium-tin oxide (ITO), Zn-doped SnO2/Ag/Zn-doped SnO2 multilayer transparent conducting electrodes were prepared on the flexible poly ethylene terephthalate (PET) substrates by RF sputtering at room temperature. To find the optimized composition of Zn-doped SnO2 thin film, which will have higher conductivity and transmittance as compared to the undoped SnO2 thin film, an off-axis Continuous Composition Spread (CCS) sputtering method was used. Zn-doped SnO2 thin films have lower resistivity than undoped SnO2 thin films due to excess oxygen vacancies (V-o) and/or zin interstitials (Zn-i) in thin films. The minimum resistivity of thin film was 0.13 Omega cm at optimized 2.43 wt% Zn-doping. Zn-doped SnO2/Ag/Zn-doped SnO2 multilayer thin films were prepared using the optimized composition deposited by an on-axis RF sputter. The multilayer TCO film has the resistivity similar to 5.33 x 10(-5) Omega cm and the average transmittance >85% in the 550 nm wavelength region. (C) 2016 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectINDIUM-TIN-OXIDE-
dc.subjectROOM-TEMPERATURE-
dc.subjectTRANSPARENT-
dc.subjectGROWTH-
dc.subjectITO-
dc.titleFull range optical and electrical properties of Zn-doped SnO2 and oxide/metal/oxide multilayer thin films deposited on flexible PET substrate-
dc.typeArticle-
dc.contributor.affiliatedAuthorNahm, Sahn-
dc.identifier.doi10.1016/j.jallcom.2016.09.293-
dc.identifier.scopusid2-s2.0-84990861069-
dc.identifier.wosid000390622900030-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.694, pp.217 - 222-
dc.relation.isPartOfJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume694-
dc.citation.startPage217-
dc.citation.endPage222-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.subject.keywordPlusINDIUM-TIN-OXIDE-
dc.subject.keywordPlusROOM-TEMPERATURE-
dc.subject.keywordPlusTRANSPARENT-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusITO-
dc.subject.keywordAuthorCCS-
dc.subject.keywordAuthorTCO-
dc.subject.keywordAuthorOMO multilayer-
dc.subject.keywordAuthorSnO2-
dc.subject.keywordAuthorDoping-
dc.subject.keywordAuthorOptical and electrical properties-
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