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PLASMA PARAMETERS AND COMPOSITION IN CF4/O-2/Ar GAS MIXTURE
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Efremov, A. M. | - |
| dc.contributor.author | Kwon, K. -H. | - |
| dc.date.accessioned | 2021-09-03T15:15:00Z | - |
| dc.date.available | 2021-09-03T15:15:00Z | - |
| dc.date.created | 2021-06-16 | - |
| dc.date.issued | 2017 | - |
| dc.identifier.issn | 0579-2991 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/86398 | - |
| dc.description.abstract | The effects of O-2/Ar mixing ratio in CF4/O-2/Ar mixture on both plasma parameters and fluxes of active species determining the dry etching kinetics in this gas system were analyzed. The investigation combined plasma diagnostics by Langmuir probes and zero-dimensional plasma modeling. It was found that the substitution of Ar with O-2 at constant fraction of CF4 in a feed gas does not result in the non-monotonic change in F atom density, as it was repeatedly reported for the binary CF4/O-2 gas mixtures. The mechanisms of this phenomenon as well as its possible impact on the etching/polymerization kinetics were discussed in details. | - |
| dc.language | English | - |
| dc.language.iso | en | - |
| dc.publisher | IVANOVSKOGO KHIMIKO-TEKHNOLOGI TSHESKOGO INST | - |
| dc.subject | MODEL-BASED ANALYSIS | - |
| dc.subject | SURFACE KINETICS | - |
| dc.subject | SIMULATION | - |
| dc.subject | CF4/O2 | - |
| dc.title | PLASMA PARAMETERS AND COMPOSITION IN CF4/O-2/Ar GAS MIXTURE | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Kwon, K. -H. | - |
| dc.identifier.doi | 10.6060/tcct.2017601.5518 | - |
| dc.identifier.scopusid | 2-s2.0-85044474859 | - |
| dc.identifier.wosid | 000442822400005 | - |
| dc.identifier.bibliographicCitation | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, v.60, no.1, pp.50 - 55 | - |
| dc.relation.isPartOf | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA | - |
| dc.citation.title | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA | - |
| dc.citation.volume | 60 | - |
| dc.citation.number | 1 | - |
| dc.citation.startPage | 50 | - |
| dc.citation.endPage | 55 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Article | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Chemistry | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
| dc.subject.keywordPlus | MODEL-BASED ANALYSIS | - |
| dc.subject.keywordPlus | SURFACE KINETICS | - |
| dc.subject.keywordPlus | SIMULATION | - |
| dc.subject.keywordPlus | CF4/O2 | - |
| dc.subject.keywordAuthor | CF4 plasma | - |
| dc.subject.keywordAuthor | diagnostics | - |
| dc.subject.keywordAuthor | modeling | - |
| dc.subject.keywordAuthor | reaction kinetics | - |
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