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Sub-5nm nanostructures fabricated by atomic layer deposition using a carbon nanotube template

Authors
Woo, Ju YeonHan, HyoKim, Ji WeonLee, Seung-MoHa, Jeong SookShim, Joon HyungHan, Chang-Soo
Issue Date
1-7월-2016
Publisher
IOP PUBLISHING LTD
Keywords
carbon nanotube; ZnO nanowire; nanopatterning; sub-5 nm; atomic layer deposition
Citation
NANOTECHNOLOGY, v.27, no.26
Indexed
SCIE
SCOPUS
Journal Title
NANOTECHNOLOGY
Volume
27
Number
26
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/88093
DOI
10.1088/0957-4484/27/26/265301
ISSN
0957-4484
Abstract
The fabrication of nanostructures having diameters of sub-5 nm is very a important issue for bottom-up nanofabrication of nanoscale devices. In this work, we report a highly controllable method to create sub-5 nm nano-trenches and nanowires by combining area-selective atomic layer deposition (ALD) with single-walled carbon nanotubes (SWNTs) as templates. Alumina nano-trenches. having a depth of 2.6 similar to 3.0 nm and SiO2 nano-trenches having a depth of 1.9 similar to 2.2 nm fully guided by the SWNTs have been formed on SiO2/Si substrate. Through infilling ZnO material by ALD in alumina nano-trenches, well-defined ZnO nanowires having a thickness of 3.1 similar to 3.3 nm have been fabricated. In order to improve the electrical properties of ZnO nanowires, as-fabricated ZnO nanowires by ALD were annealed at 350 degrees C in air for 60 min. As a result, we successfully demonstrated that as-synthesized ZnO nanowire using a specific template can be made for various high-density resistive components in the nanoelectronics industry.
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공과대학 (기계공학부)
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