Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Hyung-Youl | - |
dc.contributor.author | Jung, Woo-Shik | - |
dc.contributor.author | Kang, Dong-Ho | - |
dc.contributor.author | Jeon, Jaeho | - |
dc.contributor.author | Yoo, Gwangwe | - |
dc.contributor.author | Park, Yongkook | - |
dc.contributor.author | Lee, Jinhee | - |
dc.contributor.author | Jang, Yun Hee | - |
dc.contributor.author | Lee, Jaeho | - |
dc.contributor.author | Park, Seongjun | - |
dc.contributor.author | Yu, Hyun-Yong | - |
dc.contributor.author | Shin, Byungha | - |
dc.contributor.author | Lee, Sungjoo | - |
dc.contributor.author | Park, Jin-Hong | - |
dc.date.accessioned | 2021-09-04T03:12:19Z | - |
dc.date.available | 2021-09-04T03:12:19Z | - |
dc.date.created | 2021-06-16 | - |
dc.date.issued | 2016-02-03 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/89552 | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | EPITAXIAL GRAPHENE | - |
dc.subject | METAL-GRAPHENE | - |
dc.subject | DEVICES | - |
dc.subject | TRANSISTORS | - |
dc.title | Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Yu, Hyun-Yong | - |
dc.identifier.doi | 10.1002/adma.201503715 | - |
dc.identifier.scopusid | 2-s2.0-84956741828 | - |
dc.identifier.wosid | 000369978800007 | - |
dc.identifier.bibliographicCitation | ADVANCED MATERIALS, v.28, no.5, pp.864 - 870 | - |
dc.relation.isPartOf | ADVANCED MATERIALS | - |
dc.citation.title | ADVANCED MATERIALS | - |
dc.citation.volume | 28 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 864 | - |
dc.citation.endPage | 870 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | EPITAXIAL GRAPHENE | - |
dc.subject.keywordPlus | METAL-GRAPHENE | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | TRANSISTORS | - |
dc.subject.keywordAuthor | contact resistance | - |
dc.subject.keywordAuthor | doping | - |
dc.subject.keywordAuthor | edge contact | - |
dc.subject.keywordAuthor | graphene | - |
dc.subject.keywordAuthor | optoelectronic devices | - |
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