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Effect of Inductively Coupled Plasma on the Structural and Electrical Properties of Ti-Doped ITO Films Formed by IPVD

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dc.contributor.authorHong, Chan-Hwa-
dc.contributor.authorShin, Jae-Heon-
dc.contributor.authorPark, Nae-Man-
dc.contributor.authorKim, Kyung-Hyun-
dc.contributor.authorKim, Bo-Sul-
dc.contributor.authorSong, Chang-Woo-
dc.contributor.authorYang, Ji-Woong-
dc.contributor.authorSeo, Woo-Hyung-
dc.contributor.authorJu, Byeong-Kwon-
dc.contributor.authorCheong, Woo-Seok-
dc.date.accessioned2021-09-04T11:55:13Z-
dc.date.available2021-09-04T11:55:13Z-
dc.date.created2021-06-18-
dc.date.issued2015-10-
dc.identifier.issn1533-4880-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/92283-
dc.description.abstractIn this study, we investigated Ti-doped ITO films formed through ionized physical vapor deposition (IPVD) using inductively coupled plasma (ICP). Ti-doped ITO thin films showed an enhanced mobility with ICP power; owing to the improved crystallinity, and the sheet resistance of the Ti-doped ITO (30 nm) largely decreased from 295.1 to 134.5 ohm/sq, even during at room temperature. Therefore, IPVD technology offers a useful tool for transparent electrodes with a large area window-unified touch-screen panel.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.subjectOXIDE THIN-FILMS-
dc.subjectLIGHT-EMITTING-DIODES-
dc.subjectINDIUM-
dc.subjectDEPOSITION-
dc.subjectDC-
dc.subjectDEPENDENCE-
dc.subjectCOATINGS-
dc.subjectOXYGEN-
dc.titleEffect of Inductively Coupled Plasma on the Structural and Electrical Properties of Ti-Doped ITO Films Formed by IPVD-
dc.typeArticle-
dc.contributor.affiliatedAuthorJu, Byeong-Kwon-
dc.identifier.doi10.1166/jnn.2015.11289-
dc.identifier.scopusid2-s2.0-84947248278-
dc.identifier.wosid000365554600125-
dc.identifier.bibliographicCitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.15, no.10, pp.8099 - 8102-
dc.relation.isPartOfJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.citation.titleJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.citation.volume15-
dc.citation.number10-
dc.citation.startPage8099-
dc.citation.endPage8102-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusOXIDE THIN-FILMS-
dc.subject.keywordPlusLIGHT-EMITTING-DIODES-
dc.subject.keywordPlusINDIUM-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusDC-
dc.subject.keywordPlusDEPENDENCE-
dc.subject.keywordPlusCOATINGS-
dc.subject.keywordPlusOXYGEN-
dc.subject.keywordAuthorTOO-
dc.subject.keywordAuthorIPVD-
dc.subject.keywordAuthorTi-Doped ITO-
dc.subject.keywordAuthorICP-
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