Fabrication of superhydrophobic surfaces with nano-in-micro structures using UV-nanoimprint lithography and thermal shrinkage films

Abstract

After forming the nanoscale pillar patterns on the thermal shrinkage films (TSFs) with nano imprint lithography (NIL), the TSFs were shrunk. Thus, the nano- and microscale complex structures which have superhydrophobic and oleophobic surfaces with nano- and micro-patterns were created. The nano- and microscale complex-patterned (NMCP) TSFs were then coated with a self-assembled monolayer to reduce the surface energy of the structures. After the surface treatment, the contact angle of water on NMCP was measured to be 150.3 degrees, with the films exhibiting self-cleaning behavior. We used the NMCP TSF as a master stamp. By using UV-nanoimprint lithography, the NMCP pattern of polyurethane acrylate was successfully duplicated on a glass substrate. The duplicated NMCP pattern from master stamp had a contact angle with water of 149.8 degrees with superhydrophobicity. (C) 2015 Published by Elsevier B.V.