Steep Subthreshold Swing n- and p-Channel Operation of Bendable Feedback Field-Effect Transistors with p(+)-i-n(+) Nanowires by Dual-Top-Gate Voltage Modulation
DC Field | Value | Language |
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dc.contributor.author | Jeon, Youngin | - |
dc.contributor.author | Kim, Minsuk | - |
dc.contributor.author | Lim, Doohyeok | - |
dc.contributor.author | Kim, Sangsig | - |
dc.date.accessioned | 2021-09-04T13:52:16Z | - |
dc.date.available | 2021-09-04T13:52:16Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2015-08 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/92874 | - |
dc.description.abstract | In this study, we present the steep switching characteristics of bendable feedback field-effect transistors (FBFETs) consisting of p(+)-i-n(+) Si nanowires (NWs) and dual-top-gate structures. As a result of a positive feedback loop in the intrinsic channel region, our FBFET features the outstanding switching characteristics of an on/off current ratio of approximately 106, and point subthreshold swings (SSs) of 18-19 mV/dec in the n-channel operation mode and of 10- 23 mV/dec in the p-channel operation mode. Not only can these devices operate in n- or p-channel modes, their switching characteristics can also be modulated by adjusting the gate biases. Moreover, the device maintains its steep SS characteristics, even when the substrate is bent. This study demonstrates the promising potential of bendable NW FBFETs for use as low-power components in integrated circuits or memory devices. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | CMOS DEVICES | - |
dc.subject | SILICON | - |
dc.subject | MOS | - |
dc.title | Steep Subthreshold Swing n- and p-Channel Operation of Bendable Feedback Field-Effect Transistors with p(+)-i-n(+) Nanowires by Dual-Top-Gate Voltage Modulation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Sangsig | - |
dc.identifier.doi | 10.1021/acs.nanolett.5b00606 | - |
dc.identifier.scopusid | 2-s2.0-84939226175 | - |
dc.identifier.wosid | 000359613700010 | - |
dc.identifier.bibliographicCitation | NANO LETTERS, v.15, no.8, pp.4905 - 4913 | - |
dc.relation.isPartOf | NANO LETTERS | - |
dc.citation.title | NANO LETTERS | - |
dc.citation.volume | 15 | - |
dc.citation.number | 8 | - |
dc.citation.startPage | 4905 | - |
dc.citation.endPage | 4913 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | CMOS DEVICES | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | MOS | - |
dc.subject.keywordAuthor | Field-effect transistor | - |
dc.subject.keywordAuthor | silicon nanowires | - |
dc.subject.keywordAuthor | subthreshold swing | - |
dc.subject.keywordAuthor | sub-k(B)T/q switch | - |
dc.subject.keywordAuthor | feedback loop | - |
dc.subject.keywordAuthor | bendable substrate | - |
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