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Highly flexible titanium dioxide-based resistive switching memory with simple fabrication

Authors
Yeom, Seung-WonPark, Suk WonJung, In-SungKim, MinseokHa, Hyeon JunShim, Joon HyungJu, Byeong-Kwon
Issue Date
Oct-2014
Publisher
IOP PUBLISHING LTD
Citation
APPLIED PHYSICS EXPRESS, v.7, no.10
Indexed
SCIE
SCOPUS
Journal Title
APPLIED PHYSICS EXPRESS
Volume
7
Number
10
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/97210
DOI
10.7567/APEX.7.101801
ISSN
1882-0778
Abstract
We demonstrate a flexible resistive switching random access memory (ReRAM), which is a promising next-generation memory on a flexible substrate. The proposed method enables us to fabricate an Al/TiO2/Al structure on a polyimide substrate, which has highly flexible and durable characteristics, rather than a Si-based substrate by a simple fabrication process. To understand the role of oxygen vacancies in TiO2, our devices was analyzed by X-ray photoelectron spectroscopy (XPS) and XPS depth profile analyses. Moreover, severe bending of the device did not affect the memory performance owing to its small channel length and the high ductility of the electrode. The results presented here can provide a new approach to the fabrication of nonvolatile memories for flexible electronic devices. (C) 2014 The Japan Society of Applied Physics
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