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Morphological stability of Ag reflector for high-power GaN-based vertical light-emitting diode by addition of Ni layer

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dc.contributor.authorChoi, Young-Yun-
dc.contributor.authorSeong, Tae-Yeon-
dc.date.accessioned2021-09-05T05:44:14Z-
dc.date.available2021-09-05T05:44:14Z-
dc.date.created2021-06-15-
dc.date.issued2014-09-
dc.identifier.issn0749-6036-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/97542-
dc.description.abstractWe investigated the reasons why Ag reflectors in vertical light-emitting diodes showed much better morphological stability with the addition of an intermediate Ni layer by means of X-ray pole figures, scanning electron microscopy (SEM), and SEM electron backscatter diffraction (EBSD) techniques. The SEM results showed that, unlike the pitted Ag-only contacts, the Ni-combined Ag contacts annealed at 300 degrees C contained only hillocks, even after annealing for 60 min. The EBSD results demonstrated that the Ag-only samples were more strongly < 111 >-textured than the Ni-combined Ag samples after annealing for 60 min. The pole-figure results also indicated that, for both the samples, the {111} texture was enhanced by annealing, although the Ag-only samples were more highly < 111 >-textured than the Ni-combined Ag samples. On the basis of the SEM, EBSD, and pole-figure results, we interpret and discuss the possible mechanisms underlying the improved morphological stability of the Ni-combined Ag reflectors. (C) 2014 Elsevier Ltd. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD-
dc.subjectP-TYPE GAN-
dc.subjectOHMIC CONTACTS-
dc.subjectALLOY-
dc.subjectAGGLOMERATION-
dc.subjectRESISTANCE-
dc.subjectGROWTH-
dc.subjectPERFORMANCE-
dc.subjectFABRICATION-
dc.subjectSILVER-
dc.subjectFILMS-
dc.titleMorphological stability of Ag reflector for high-power GaN-based vertical light-emitting diode by addition of Ni layer-
dc.typeArticle-
dc.contributor.affiliatedAuthorSeong, Tae-Yeon-
dc.identifier.doi10.1016/j.spmi.2014.06.007-
dc.identifier.scopusid2-s2.0-84903943675-
dc.identifier.wosid000341554500034-
dc.identifier.bibliographicCitationSUPERLATTICES AND MICROSTRUCTURES, v.73, pp.342 - 349-
dc.relation.isPartOfSUPERLATTICES AND MICROSTRUCTURES-
dc.citation.titleSUPERLATTICES AND MICROSTRUCTURES-
dc.citation.volume73-
dc.citation.startPage342-
dc.citation.endPage349-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusP-TYPE GAN-
dc.subject.keywordPlusOHMIC CONTACTS-
dc.subject.keywordPlusALLOY-
dc.subject.keywordPlusAGGLOMERATION-
dc.subject.keywordPlusRESISTANCE-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusSILVER-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthorAg reflector-
dc.subject.keywordAuthorX-ray pole figure-
dc.subject.keywordAuthorElectron backscatter diffraction-
dc.subject.keywordAuthorLED-
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SEONG, TAE YEON
공과대학 (신소재공학부)
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