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Application of dense nano-thin platinum films for low-temperature solid oxide fuel cells by atomic layer deposition

Authors
Ji, SanghoonChang, IkwhangCho, Gu YoungLee, Yoon HoShim, Joon HyungCha, Suk Won
Issue Date
4-8월-2014
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Keywords
Atomic layer deposition; Platinum; Dense; Nano-thin; Solid oxide fuel cell
Citation
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, v.39, no.23, pp.12402 - 12408
Indexed
SCIE
SCOPUS
Journal Title
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
Volume
39
Number
23
Start Page
12402
End Page
12408
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/97714
DOI
10.1016/j.ijhydene.2014.02.081
ISSN
0360-3199
Abstract
Nano-thin platinum (Pt) films with a dense microstructure for low-temperature solid oxide fuel cells (LT-SOFCs) were fabricated by atomic layer deposition (ALD) and were characterized in terms of their micro-structural properties and electrochemical performance. Pt thin films with a purity level of similar to 99% were achieved by controlling the O-2 pulsing time. The agglomeration behavior of the ALD Pt thin films was characterized by the annealing temperature, becoming extremely severe above 550 degrees C. An LT-SOFC with a 25 nm thick dense ALD Pt cathode layer exhibited a peak power density of similar to 110 mW/cm(2) at 450 degrees C. Copyright (C) 2014, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.
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공과대학 (기계공학부)
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