Fabrication of silica nanostructures with a microwave assisted direct patterning process
DC Field | Value | Language |
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dc.contributor.author | Shin, Ju-Hyeon | - |
dc.contributor.author | Go, Bit-Na | - |
dc.contributor.author | Choi, Je-Hong | - |
dc.contributor.author | Kim, Jin-Seoung | - |
dc.contributor.author | Jung, Gun-Young | - |
dc.contributor.author | Kim, Heetae | - |
dc.contributor.author | Lee, Heon | - |
dc.date.accessioned | 2021-09-05T08:02:15Z | - |
dc.date.available | 2021-09-05T08:02:15Z | - |
dc.date.created | 2021-06-15 | - |
dc.date.issued | 2014-06-06 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/98250 | - |
dc.description.abstract | Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of SiO2, which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, moth-eye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.subject | LIGHT EXTRACTION | - |
dc.subject | TIO2 | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | FILMS | - |
dc.title | Fabrication of silica nanostructures with a microwave assisted direct patterning process | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1088/0957-4484/25/22/225301 | - |
dc.identifier.scopusid | 2-s2.0-84947712492 | - |
dc.identifier.wosid | 000336728400005 | - |
dc.identifier.bibliographicCitation | NANOTECHNOLOGY, v.25, no.22 | - |
dc.relation.isPartOf | NANOTECHNOLOGY | - |
dc.citation.title | NANOTECHNOLOGY | - |
dc.citation.volume | 25 | - |
dc.citation.number | 22 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | LIGHT EXTRACTION | - |
dc.subject.keywordPlus | TIO2 | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordAuthor | microwave heating | - |
dc.subject.keywordAuthor | microwave assisted direct patterning | - |
dc.subject.keywordAuthor | soft lithography | - |
dc.subject.keywordAuthor | PDMS mold | - |
dc.subject.keywordAuthor | SiO2 nano-particle dispersed solution | - |
dc.subject.keywordAuthor | moth-eye pattern | - |
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