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Fabrication of silica nanostructures with a microwave assisted direct patterning process

Authors
Shin, Ju-HyeonGo, Bit-NaChoi, Je-HongKim, Jin-SeoungJung, Gun-YoungKim, HeetaeLee, Heon
Issue Date
6-6월-2014
Publisher
IOP PUBLISHING LTD
Keywords
microwave heating; microwave assisted direct patterning; soft lithography; PDMS mold; SiO2 nano-particle dispersed solution; moth-eye pattern
Citation
NANOTECHNOLOGY, v.25, no.22
Indexed
SCIE
SCOPUS
Journal Title
NANOTECHNOLOGY
Volume
25
Number
22
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/98250
DOI
10.1088/0957-4484/25/22/225301
ISSN
0957-4484
Abstract
Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of SiO2, which consisted of coalesced silica nanoparticles, were formed on glass substrates from SiO2 nano-particle dispersed solutions with varied microwave heating time. Optical properties and surface morphologies of micro-sized hemisphere, nano-sized pillar, moth-eye and 50 nm sized line/space silica patterns were measured using UV-vis and a scanning electron microscope. X-ray diffraction analysis of SiO2 thin films with and without microwave heating was also carried out.
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