One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer
DC Field | Value | Language |
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dc.contributor.author | Choi, Kyung-Hak | - |
dc.contributor.author | Huh, Jinwoo | - |
dc.contributor.author | Cui, Yonghao | - |
dc.contributor.author | Trivedi, Krutarth | - |
dc.contributor.author | Hu, Walter | - |
dc.contributor.author | Ju, Byeong-Kwon | - |
dc.contributor.author | Lee, Jeong-Bong | - |
dc.date.accessioned | 2021-09-05T08:28:33Z | - |
dc.date.available | 2021-09-05T08:28:33Z | - |
dc.date.created | 2021-06-15 | - |
dc.date.issued | 2014-06 | - |
dc.identifier.issn | 2072-666X | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/98404 | - |
dc.description.abstract | Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | MDPI | - |
dc.subject | SUPERPRISM PHENOMENA | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | LIGHT | - |
dc.title | One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Ju, Byeong-Kwon | - |
dc.identifier.doi | 10.3390/mi5020228 | - |
dc.identifier.scopusid | 2-s2.0-84902585965 | - |
dc.identifier.wosid | 000338343700008 | - |
dc.identifier.bibliographicCitation | MICROMACHINES, v.5, no.2, pp.228 - 238 | - |
dc.relation.isPartOf | MICROMACHINES | - |
dc.citation.title | MICROMACHINES | - |
dc.citation.volume | 5 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 228 | - |
dc.citation.endPage | 238 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Instruments & Instrumentation | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Analytical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Instruments & Instrumentation | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | SUPERPRISM PHENOMENA | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | LIGHT | - |
dc.subject.keywordAuthor | combined-nanoimprint-and-photolithography | - |
dc.subject.keywordAuthor | photonic crystals | - |
dc.subject.keywordAuthor | hybrid mask mold | - |
dc.subject.keywordAuthor | TM polarizer | - |
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