One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer
- Authors
- Choi, Kyung-Hak; Huh, Jinwoo; Cui, Yonghao; Trivedi, Krutarth; Hu, Walter; Ju, Byeong-Kwon; Lee, Jeong-Bong
- Issue Date
- 6월-2014
- Publisher
- MDPI
- Keywords
- combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer
- Citation
- MICROMACHINES, v.5, no.2, pp.228 - 238
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROMACHINES
- Volume
- 5
- Number
- 2
- Start Page
- 228
- End Page
- 238
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/98404
- DOI
- 10.3390/mi5020228
- ISSN
- 2072-666X
- Abstract
- Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
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