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Effects of geometrically extended contact area on electrical properties in amorphous InGaZnO thin film transistors

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dc.contributor.authorKim, Jae-Sung-
dc.contributor.authorJoo, Min-Kyu-
dc.contributor.authorPiao, Ming Xing-
dc.contributor.authorAhn, Seung-Eon-
dc.contributor.authorChoi, Yong-Hee-
dc.contributor.authorNa, Junhong-
dc.contributor.authorShin, Minju-
dc.contributor.authorHan, Man-Joong-
dc.contributor.authorJang, Ho-Kyun-
dc.contributor.authorKim, Gyu-Tae-
dc.date.accessioned2021-09-05T08:56:39Z-
dc.date.available2021-09-05T08:56:39Z-
dc.date.created2021-06-15-
dc.date.issued2014-05-02-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/98544-
dc.description.abstractTo elucidate the effect of the contact geometry on the device performances, the amorphous InGaZnO field effect transistors with different contact areas were fabricated and compared by the transmission line method. Extended contact-area devices were found to have better electrical performances in field effect mobility and subthreshold swing than those of bar-shaped reference devices. These improvements in the device characteristics resulted from a significantly reduced contact resistance (R-c). From the comparison of specific contact resistivity and transfer length (L-T), the relationship between R-c and contact area including the contact width and the L-T was established and demonstrated that R-c is controllable by optimizing the contact area geometry. (C) 2014 Published by Elsevier B. V.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectRESISTANCE-
dc.subjectTHICKNESS-
dc.titleEffects of geometrically extended contact area on electrical properties in amorphous InGaZnO thin film transistors-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Gyu-Tae-
dc.identifier.doi10.1016/j.tsf.2014.02.026-
dc.identifier.scopusid2-s2.0-84898813393-
dc.identifier.wosid000334314100042-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.558, pp.279 - 282-
dc.relation.isPartOfTHIN SOLID FILMS-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume558-
dc.citation.startPage279-
dc.citation.endPage282-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusRESISTANCE-
dc.subject.keywordPlusTHICKNESS-
dc.subject.keywordAuthorAmorphous oxide-
dc.subject.keywordAuthorInGaZnO-
dc.subject.keywordAuthorThin film transistor-
dc.subject.keywordAuthorTransmission line method-
dc.subject.keywordAuthorContact resistance-
dc.subject.keywordAuthorTransfer length-
dc.subject.keywordAuthorSpecific contact resistivity-
dc.subject.keywordAuthorContact area-
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