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Electrochemical characteristics of amorphous silicon thin film electrode with fluoroethylene carbonate additive

Authors
Kim, Jung SubByun, DongjinLee, Joong Kee
Issue Date
4월-2014
Publisher
ELSEVIER SCIENCE BV
Keywords
Amorphous materials; Chemical vapor deposition; Interface; Thin films
Citation
CURRENT APPLIED PHYSICS, v.14, no.4, pp.596 - 602
Indexed
SCIE
SCOPUS
KCI
Journal Title
CURRENT APPLIED PHYSICS
Volume
14
Number
4
Start Page
596
End Page
602
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/98881
DOI
10.1016/j.cap.2014.02.008
ISSN
1567-1739
Abstract
The electrochemical and compositional changes of a solid electrolyte interphase (SEI) layer formed on the surface of silicon thin film are investigated in order to determine the effect of the content of fluoroethylene carbonate (FEC) additive in the electrolyte. Comparisons are made with FEC-free electrolyte, in which the major components are (CH2OCO2Li)(2) and Li2CO3. The (CH2OCO2Li)(2) and Li2CO3 of the SEI layer in the FEC-containing electrolyte decreases, and polycarbonate and LiF increase relatively with the repression of -OCO2Li groups. The additive affects the composition of the SEI layer, which leads to lower resistance. The electrochemical performance regarding cycle retention, coulombic efficiency, rate capability, and discharge capacity in the FEC-containing cell are significantly enhanced compared to that of the FEC-free electrolyte. The observed optimum FEC concentration in the electrolyte is 1.5%, due to the reduced charge transfer and SEI resistance in our experimental range. (C) 2014 Elsevier B. V. All rights reserved.
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