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Study on the effects of proton irradiation on the dc characteristics of AlGaN/GaN high electron mobility transistors with source field plate

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dc.contributor.authorLiu, Lu-
dc.contributor.authorHwang, Ya-Hsi-
dc.contributor.authorXi, Yuyin-
dc.contributor.authorRen, Fan-
dc.contributor.authorCraciun, Valentin-
dc.contributor.authorPearton, Stephen J.-
dc.contributor.authorYang, Gwangseok-
dc.contributor.authorKim, Hong-Yeol-
dc.contributor.authorKim, Jihyun-
dc.date.accessioned2021-09-05T11:00:12Z-
dc.date.available2021-09-05T11:00:12Z-
dc.date.created2021-06-15-
dc.date.issued2014-03-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/99138-
dc.description.abstractThe effects of proton irradiation dose on the dc characteristics of AlGaN/GaN high electron mobility transistors (HEMTs) with source field plates were studied. The HEMTs were irradiated with various protons doses ranging from 5 x 10(12) to 5 x 10(15) cm(-2) at a fixed energy of 5 MeV. HEMTs irradiated with proton dose below 5 x 10(13) cm(-2) showed less than 2% degradation of either saturation drain current (I-DSS) or transconductance (g(m)). Significant changes of these parameters were observed for the devices irradiated with doses above 5 x 10(13) cm(-2). HEMTs irradiated with the highest proton dose of 5 x 10(15) cm(-2) showed a reduction of I-DSS and g(m) of 86% and 64.7%, and a positive V-th shift of 0.84 V, respectively. Despite the significant I-DSS and g(m) reductions, the off-state drain breakdown voltage (V-BR) was improved more than five times at this particular irradiation condition. The significant improvement of off-state drain breakdown voltage was attributed to the formation of a virtual gate at drain side of gate edge, which was the result of the generation of defect centers at AlGaN/GaN interface. (C) 2014 American Vacuum Society.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectNATIVE DEFECTS-
dc.titleStudy on the effects of proton irradiation on the dc characteristics of AlGaN/GaN high electron mobility transistors with source field plate-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1116/1.4866401-
dc.identifier.scopusid2-s2.0-84898988235-
dc.identifier.wosid000333560600056-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.32, no.2-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume32-
dc.citation.number2-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusNATIVE DEFECTS-
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