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Fabrication of Nano-Structures on Glass Substrate by Modified Nano-Imprint Patterning with a Plasma-Induced Surface-Oxidized Cr Mask

Authors
Lee, So HeeLee, Su YeonLee, Seong EuiLee, HeonLee, Hee Chul
Issue Date
3월-2014
Publisher
KOREAN INST METALS MATERIALS
Keywords
nano-imprint lithography; nano-structures; glass patterning; optical transmittance; plasma oxidation
Citation
ELECTRONIC MATERIALS LETTERS, v.10, no.2, pp.351 - 355
Indexed
SCIE
SCOPUS
KCI
Journal Title
ELECTRONIC MATERIALS LETTERS
Volume
10
Number
2
Start Page
351
End Page
355
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/99192
DOI
10.1007/s13391-013-3230-z
ISSN
1738-8090
Abstract
In this study, we introduce a process for fabrication of nano-sized structural arrays on glass using modified nanoimprint patterning. A PVC (polyvinyl chloride) stamp was prepared by hot embossing, and a Cr-oxide-pattern etch-mask was used. The etch-mask was formed by oxidizing the surface of exposed Cr region by oxygen plasma treatment at room temperature. The fabrication of the etch-mask was conducted by immersing the locally oxidized Cr pattern in resin remover and Cr-etchant. The residual UV resin and un-oxidized Cr pattern were selectively removed, resulting in the obvious array of Cr-oxide etch-mask-pattern. The array of glass nanostructures was formed by reactive ion etching (RIE) using CF4 and Ar gas discharge. After removing the Cr-oxide mask, the final nano-structure had a height of 40 nm and a diameter of 170 nm, which was slightly less than the diameter of the original master-mold. The plasma treatment gave rise to a rough glass surface with root-mean-square (RMS) roughness of 29.25 nm, while that of bare glass was 0.66 nm. A high optical transmittance due to reduction in reflectance was observed at the plasma-treated rough surface, as well as for the array of nanostructures. The highest measured optical transmittance was 97.2% at a wavelength of 550 nm; an increase of about 7.2% compared to bare glass.
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Lee, Heon
공과대학 (신소재공학부)
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