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Vibration atomic layer deposition for conformal nanoparticle coating

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dc.contributor.authorPark, Suk Won-
dc.contributor.authorKim, Jun Woo-
dc.contributor.authorChoi, Hyung Jong-
dc.contributor.authorShim, Joon Hyung-
dc.date.accessioned2021-09-05T12:44:41Z-
dc.date.available2021-09-05T12:44:41Z-
dc.date.created2021-06-15-
dc.date.issued2014-01-
dc.identifier.issn0734-2101-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/99678-
dc.description.abstractA vibration atomic layer deposition reactor was developed for fabricating a conformal thin-film coating on nanosize particles. In this study, atomic layer deposition of 10-15-nm-thick Al2O3 films was conducted on a high-surface-area acetylene black powder with particle diameters of 200-250 nm. Intense vibration during the deposition resulted in the effective separation of particles, overcoming the interparticle agglomeration force and enabling effective diffusion of the precursor into the powder chunk; this phenomenon led to the formation of a conformal film coating on the nanopowder particles. It was also confirmed that the atomic layer deposition Al2O3 films initially grew on the high-surface-area acetylene black powder particles as discrete islands, presumably because chemisorption of the precursor and water occurred only on a few sites on the high-surface-area acetylene black powder surface. Relatively sluggish growth of the films during the initial atomic layer deposition cycles was identified from composition analysis. (C) 2014 American Vacuum Society.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectFLUIDIZED-BED REACTOR-
dc.subjectTHIN-FILM GROWTH-
dc.subjectROTARY REACTOR-
dc.subjectPARTICLES-
dc.subjectFORCES-
dc.subjectALD-
dc.titleVibration atomic layer deposition for conformal nanoparticle coating-
dc.typeArticle-
dc.contributor.affiliatedAuthorShim, Joon Hyung-
dc.identifier.doi10.1116/1.4845735-
dc.identifier.scopusid2-s2.0-84891762581-
dc.identifier.wosid000335847600015-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.32, no.1-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.citation.volume32-
dc.citation.number1-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusFLUIDIZED-BED REACTOR-
dc.subject.keywordPlusTHIN-FILM GROWTH-
dc.subject.keywordPlusROTARY REACTOR-
dc.subject.keywordPlusPARTICLES-
dc.subject.keywordPlusFORCES-
dc.subject.keywordPlusALD-
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