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Effect of 5 MeV proton radiation on DC performance and reliability of circular-shaped AlGaN/GaN high electron mobility transistors

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dc.contributor.authorXi, Yuyin-
dc.contributor.authorHsieh, Yueh-Ling-
dc.contributor.authorHwang, Ya-Hsi-
dc.contributor.authorLi, Shun-
dc.contributor.authorRen, Fan-
dc.contributor.authorPearton, Stephen J.-
dc.contributor.authorPatrick, Erin-
dc.contributor.authorLaw, Mark E.-
dc.contributor.authorYang, Gwangseok-
dc.contributor.authorKim, Hong-Yeol-
dc.contributor.authorKim, Jihyun-
dc.contributor.authorBaca, Albert G.-
dc.contributor.authorAllerman, Andrew A.-
dc.contributor.authorSanchez, Carlos A.-
dc.date.accessioned2021-09-05T12:54:56Z-
dc.date.available2021-09-05T12:54:56Z-
dc.date.created2021-06-15-
dc.date.issued2014-01-
dc.identifier.issn1071-1023-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/99726-
dc.description.abstractThe authors report an investigation of the effect of different doses of 5 MeV proton irradiation on circular-shaped AlGaN/GaN high electron mobility transistors. The degradation of saturation drain current (I-DSS) was minimal up to an irradiation dose of 2 x 10 13 cm(-2). By comparison, a dose of 2 x 10 14 cm(-2) dose produced a 12.5% reduction of IDSS and 9.2% increase of sheet resistance. In addition, the threshold voltage showed larger positive shifts for 2 x 10 14 cm(-2) dose compared to 2 x 10 13 cm(-2), and both of these doses produced showed larger shifts for smaller gate to drain distances. Increases of 39.8% and 47.1%, respectively, in the breakdown voltage for 6 and 10 mu m drain to gate distances (L-GD) was observed and was attributed to the creation of a virtual gate at the AlGaN/GaN interface due to the irradiation, which reduced the peak electric field at the drain side of the gate edge. (C) 2014 American Vacuum Society.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherA V S AMER INST PHYSICS-
dc.subjectIRRADIATION-
dc.titleEffect of 5 MeV proton radiation on DC performance and reliability of circular-shaped AlGaN/GaN high electron mobility transistors-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Jihyun-
dc.identifier.doi10.1116/1.4836577-
dc.identifier.scopusid2-s2.0-84929428173-
dc.identifier.wosid000330774300026-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.32, no.1-
dc.relation.isPartOfJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B-
dc.citation.volume32-
dc.citation.number1-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusIRRADIATION-
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