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Effect of Heating Rate on the Refining of Metallurgical-Grade Silicon during Fractional Melting

Authors
Chung, JuhoLee, ChangbumYoon, Wooyoung
Issue Date
10월-2013
Publisher
IOP PUBLISHING LTD
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10
Indexed
SCIE
Journal Title
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume
52
Number
10
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/101965
DOI
10.7567/JJAP.52.10MB04
ISSN
0021-4922
Abstract
Silicon was purified using fractional melting (FM), which is a more effective refining method than fractional solidification. Changes in the silicon microstructure during FM were observed using a scanning electron microscope (SEM) and an electron probe microanalyzer (EPMA). Purity of each sample was investigated using inductively coupled plasma atomic emission spectrometry (ICP-AES) to determine the effects of various heating rates on the efficiency of FM. A refining ratio of 97.28% was the best result that could be obtained for the sample that was heated at a rate of 15 degrees C/min. For the samples that were heated below 1390 degrees C lower heating rate resulted in higher refining efficiency. Acid-leaching yielded 99.98% pure silicon samples after FM. (C) 2013 The Japan Society of Applied Physics
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