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Investigation on the Temperature Dependence of the Performance of Solution Processed Si-Zn-Sn Oxide Thin Film Transistor
- Authors
- Choi, Jun Young; Kim, Sang Sig; Lee, Sang Yeol
- Issue Date
- 10월-2013
- Publisher
- AMER SCIENTIFIC PUBLISHERS
- Keywords
- Oxide Thin Film Transistors; SiZnSnO; Solution Process
- Citation
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.13, no.10, pp.7089 - 7091
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
- Volume
- 13
- Number
- 10
- Start Page
- 7089
- End Page
- 7091
- ISSN
- 1533-4880
- Abstract
- The performance of the oxide thin film transistors (TFTs) using silicon zinc tin oxide (SZTO) as active channel layer fabricated by solution process method has been reported investigated depending on the annealing temperature. The SZTO TFTs fabricated on silicon wafers exhibit a mobility of 0.591 cm(2)/Vs, a subthreshold swing (S. S) of 0.44 V/decade, a threshold voltage of 0.7 V and an I-on/off ratio of 4.4x10(6).
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