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Planar Hall effect in a single GaMnAs film grown on Si substrate

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dc.contributor.authorWon, Jaehyuk-
dc.contributor.authorShin, Jinsik-
dc.contributor.authorLee, Sangyeop-
dc.contributor.authorLee, Hakjoon-
dc.contributor.authorYoo, Taehee-
dc.contributor.authorLee, Sanghoon-
dc.contributor.authorLiu, X.-
dc.contributor.authorFurdyna, J. K.-
dc.date.accessioned2021-09-05T21:54:54Z-
dc.date.available2021-09-05T21:54:54Z-
dc.date.created2021-06-14-
dc.date.issued2013-09-01-
dc.identifier.issn0022-0248-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/102198-
dc.description.abstractWe carried out systematic planar Hall effect (PHE) measurements on a layer of GaMnAs grown on a Si substrate. The field scans of the planar Hall resistance (PHR) data obtained at 4 K show a transition behavior, which is similar to the magnetization reorientation process often observed in GaMnAs film grown on a GaAs substrate that has both anisotropies along the < 100 > and the < 110 > directions. The dependence of the PHR on the applied field direction revealed the presence of an asymmetry between the < 100 > and the < 110 > directions in the magnetic energy of the film. The directions of the magnetic easy axes determined by the PHR value at zero field were about 9 degrees away from the < 110 > directions. The PHR further shows the absence of the difference in the anisotropy between the < 110 > directions, indicating no preference of magnetic anisotropy for either the [110] or the [(1) over bar 10] direction in the GaMnAs grown on a Si substrate. (c) 2012 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectSEMICONDUCTORS-
dc.subjectFERROMAGNETISM-
dc.subjectMN)AS-
dc.subject(GA-
dc.titlePlanar Hall effect in a single GaMnAs film grown on Si substrate-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Sanghoon-
dc.identifier.doi10.1016/j.jcrysgro.2012.12.062-
dc.identifier.scopusid2-s2.0-84885419926-
dc.identifier.wosid000323355900090-
dc.identifier.bibliographicCitationJOURNAL OF CRYSTAL GROWTH, v.378, pp.361 - 364-
dc.relation.isPartOfJOURNAL OF CRYSTAL GROWTH-
dc.citation.titleJOURNAL OF CRYSTAL GROWTH-
dc.citation.volume378-
dc.citation.startPage361-
dc.citation.endPage364-
dc.type.rimsART-
dc.type.docTypeArticle; Proceedings Paper-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaCrystallography-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryCrystallography-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSEMICONDUCTORS-
dc.subject.keywordPlusFERROMAGNETISM-
dc.subject.keywordPlusMN)AS-
dc.subject.keywordPlus(GA-
dc.subject.keywordAuthorCharacterization-
dc.subject.keywordAuthorMolecular beam epitaxy-
dc.subject.keywordAuthorGallium compounds-
dc.subject.keywordAuthorSemiconducting III-VI materials-
dc.subject.keywordAuthorMagnetic materials-
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