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High post-annealing stability in [Pt/Co] multilayers

Authors
Lee, Tae YoungSon, Dong SuLim, Sang HoLee, Seong-Rae
Issue Date
7-6월-2013
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.113, no.21
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF APPLIED PHYSICS
Volume
113
Number
21
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/102983
DOI
10.1063/1.4809130
ISSN
0021-8979
Abstract
The [Pt/Co] multilayers with a very thin Pt layer of 0.2 nm are presented that exhibit strong perpendicular magnetic anisotropy (PMA) even after annealing up to 500 degrees C. The observed post-annealing stability is in significant contrast to that previously shown for conventional multilayers with a thicker Pt layer than Co, where good PMA properties are obtained in the as-deposited state but they deteriorate significantly at moderate annealing temperatures below similar to 300 degrees C. The reason for the high post-annealing stability is a low level of intermixing during sputtering due to the very thin Pt layer. (C) 2013 AIP Publishing LLC.
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공과대학 (신소재공학부)
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