AlGaN-based ultraviolet light-emitting diodes using fluorine-doped indium tin oxide electrodes
- Authors
- Chae, Dong Ju; Kim, Dong Yoon; Kim, Tae Geun; Sung, Yun Mo; Kim, Moon Doeck
- Issue Date
- 20-2월-2012
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.100, no.8
- Indexed
- SCIE
SCOPUS
- Journal Title
- APPLIED PHYSICS LETTERS
- Volume
- 100
- Number
- 8
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/105453
- DOI
- 10.1063/1.3689765
- ISSN
- 0003-6951
- Abstract
- In this paper, improved electrical and optical properties of aluminum gallium nitride (AlGaN)-based ultraviolet light-emitting diodes using fluorine-doped indium tin oxide (F-ITO) electrodes are reported. F-doping was found to increase the work function as well as the energy bandgap of the ITO and, thereby, reduce the Shottky barrier height in contact with p-(Al)GaN. As a result, the optical transmittance increased from 79.7% to 86.9% at 380 nm, while the specific contact resistance decreased from 1.04 x 10(-3) Omega.cm(2) to 9.12 x 10(-4) Omega.cm(2) after F-doping, which led to an increase in the output power from 2.41 mW to 5.99 mW. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3689765]
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Collections - College of Engineering > School of Electrical Engineering > 1. Journal Articles
- College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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