UV ozone treatment for improving contact resistance on graphene
- Authors
- Chen, Chung Wei; Ren, Fan; Chi, Gou-Chung; Hung, Sheng-Chun; Huang, Y. P.; Kim, Jihyun; Kravchenko, Ivan I.; Pearton, Stephen J.
- Issue Date
- 11월-2012
- Publisher
- A V S AMER INST PHYSICS
- Citation
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.30, no.6
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
- Volume
- 30
- Number
- 6
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/106996
- DOI
- 10.1116/1.4754566
- ISSN
- 1071-1023
- Abstract
- Optimized UV ozone cleaning of graphene layers on SiO2/Si substrates is shown to improve contact resistance of e-beam evaporated Ti/Au contacts by three orders of magnitude (3 x 10(-6) Omega-cm(2)) compared to untreated surfaces (4 x 10(-3) Omega-cm(2)). Subsequent annealing at 300 degrees C lowers the minimum value achieved to 7 x 10(-7) Omega-cm(2). Ozone exposure beyond an optimum time (6 min in these experiments) led to a sharp increase in sheet resistance of the graphene, producing degraded contact resistance. The UV ozone treatment is a simple and effective method for producing high quality contacts to graphene. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4754566]
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Collections - College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles
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