Super-resolution Optical Measurement of Nanoscale Photoacid Distribution in Lithographic Materials
- Authors
- Berro, Adam J.; Berglund, Andrew J.; Carmichael, Peter T.; Kim, Jong-Seung; Liddle, J. Alexander
- Issue Date
- 11월-2012
- Publisher
- AMER CHEMICAL SOC
- Keywords
- single-molecule fluorescence; super-resolution microscopy; chemically amplified resist; lithography; photoacid
- Citation
- ACS NANO, v.6, no.11, pp.9496 - 9502
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS NANO
- Volume
- 6
- Number
- 11
- Start Page
- 9496
- End Page
- 9502
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/107117
- DOI
- 10.1021/nn304285m
- ISSN
- 1936-0851
- Abstract
- We demonstrate a method using photoactivation localization microscopy (PALM) in a soft-material system, with a rhodamine-lactam dye that is activated by both ultraviolet light and protonation, to reveal the nanoscale photoacid distribution in a model photoresist. Chemically amplified resists are the principal lithographic materials used in the semiconductor industry. The photoacid distribution generated upon exposure and its subsequent evolution during post-exposure bake is a major limiting factor in determining the resolution and lithographic quality of the final developed resist image. Our PALM data sets resolve the acid distribution in a latent Image with subdiffraction limit accuracy. Our overall accuracy is currently limited by residual mechanical drift.
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- Appears in
Collections - College of Science > Department of Chemistry > 1. Journal Articles
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