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A millimeter-range flexure-based nano-positioning stage using a self-guided displacement amplification mechanism

Authors
Kim, Jung-JaeChoi, Young-ManAhn, DahoonHwang, BeomseokGweon, Dae-GabJeong, Jaehwa
Issue Date
4월-2012
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Keywords
Flexure; Nano-positioning stage; Displacement amplification; Piezo-actuator
Citation
MECHANISM AND MACHINE THEORY, v.50, pp.109 - 120
Indexed
SCIE
SCOPUS
Journal Title
MECHANISM AND MACHINE THEORY
Volume
50
Start Page
109
End Page
120
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/108791
DOI
10.1016/j.mechmachtheory.2011.11.012
ISSN
0094-114X
Abstract
We propose a mechanism for a single-axis flexure-based nano-positioning stage. A self-guided displacement amplification mechanism enables a large range of motion-up to a millimeter-with a compact stage size. Our device has a skewed double-compound parallelogram structure that acts as a motion guide and provides displacement amplification, thereby eliminating a serial connection. Its structural symmetry improves positioning accuracy by reducing parasitic motion error and thermal deformation. A millimeter-range piezo-actuated nano-positioning stage is implemented using the self-guided displacement amplification mechanism. The stage was designed using design optimization frameworks to obtain the highest fundamental resonance frequency under constraints for predetermined travel range, stress, and size. The effectiveness of the proposed mechanism is experimentally verified. Also, we demonstrate that the fabricated stage has superior volume efficency compared to other stages of similar size. (C) 2011 Elsevier Ltd. All rights reserved.
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Jeong, Jae hwa
과학기술대학 (전자·기계융합공학과)
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