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Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

Authors
Yang, Ki-YeonOh, Sang-ChulPark, HyungwonLee, Heon
Issue Date
9월-2011
Publisher
A V S AMER INST PHYSICS
Citation
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.29, no.5
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume
29
Number
5
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/111709
DOI
10.1116/1.3628585
ISSN
1071-1023
Abstract
Hydrogen silsesquioxane (HSQ), a type of spin-on glass, is an attractive material for nanobio, semiconductor and photoelectronic applications because it can be transformed into SiO2 by a simple annealing process. Studies on the fabrication of nanosized structures are necessary for the simple and easy production of HSQ nanostructures because of their unique characteristics. In this study, a fabrication method was developed for HSQ nanostructures as small as 50 nm using a direct printing technique with a poly (dimethylsiloxane) (PDMS) mold. Using this technique, HSQ nanostructures can be fabricated on a curved substrate (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3628585]
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공과대학 (신소재공학부)
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