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Fabrication of multi-level switching phase change nano-pillar device using InSe/GeSbTe stacked structure

Authors
Hong, Sung-HoonLee, HeonChoi, YunjungLee, Young-Kook
Issue Date
9월-2011
Publisher
ELSEVIER SCIENCE BV
Keywords
Multi-level switching; InSe/GeSbTe; InSe; Conductive AFM; Nanoimprint lithography
Citation
CURRENT APPLIED PHYSICS, v.11, no.5, pp.S16 - S20
Indexed
SCIE
SCOPUS
KCI
Journal Title
CURRENT APPLIED PHYSICS
Volume
11
Number
5
Start Page
S16
End Page
S20
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/111751
DOI
10.1016/j.cap.2011.06.018
ISSN
1567-1739
Abstract
The InSe/GeSbTe stacked phase change materials were investigated at nano-scale for multi-level switching with a large sensing margin and fast switching. The 200 nm nano-pillar devices of InSe material and InSe/GeSbTe materials were fabricated using NIL, and its electrical properties were characterized using conducting AFM system, that was connected to a pulse generator and a voltage source. In case of InSe based nano-pillar device, it was evaluated that the fast switching speed (<100 ns) and large difference of resistance on-off ratio (>10,000) and exhibited only bi-level switching characteristics. In case of the InSe/GeSbTe PCMs structure exhibited three levels of resistance state with a few hundred times of difference between them with 100 ns reset pulse. (C) 2011 Elsevier B.V. All rights reserved.
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공과대학 (신소재공학부)
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