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Deoxyribonucleic Acid Sensitive Graphene Field-Effect Transistors

Authors
Hwang, JongseungKim, HeetaeLee, JaehyunWhang, DongmokHwang, Sungwoo
Issue Date
May-2011
Publisher
IEICE-INST ELECTRONICS INFORMATION COMMUNICATIONS ENG
Keywords
graphene; chemical vapour deposition; transport; field-effect transistor; DNA
Citation
IEICE TRANSACTIONS ON ELECTRONICS, v.E94C, no.5, pp.826 - 829
Indexed
SCOPUS
Journal Title
IEICE TRANSACTIONS ON ELECTRONICS
Volume
E94C
Number
5
Start Page
826
End Page
829
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/112488
DOI
10.1587/transele.E94.C.826
ISSN
1745-1353
Abstract
We have investigated the effect of deoxyribonucleic acid (DNA) adsorption on a graphene field-effect-transistor (FET) device. We have used graphene which is grown on a Ni substrate by chemical vapour deposition. The Raman spectra of our graphene indicate its high quality, and also show that it consists of only a few layers. The current-voltage characteristics of our bare graphene strip FET show a hole conduction behavior, and the gate sensitivity of 0.0034 mu A/V, which is reasonable with the size of the strip (5 x 10 mu m(2)). After the adsorption of 30 base pairs single-stranded poly (dT) DNA molecules, the conductance and gate operation of the graphene FET exhibit almost 11% and 18% decrease from those of the bare graphene FET device. The observed change may suggest a large sensitivity for a small enough (nm size) graphene strip with larger semiconducting property.
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