Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process
DC Field | Value | Language |
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dc.contributor.author | Jang, Jin Nyoung | - |
dc.contributor.author | Lee, You Jong | - |
dc.contributor.author | Lee, Jun Young | - |
dc.contributor.author | Jang, Yun Sung | - |
dc.contributor.author | Hong, MunPyo | - |
dc.contributor.author | Oh, Kyoung Suk | - |
dc.contributor.author | Yoo, Suk Jae | - |
dc.contributor.author | Kim, Daechul | - |
dc.contributor.author | Lee, Bonju | - |
dc.contributor.author | Jang, Won-Gun | - |
dc.date.accessioned | 2021-09-07T15:57:26Z | - |
dc.date.available | 2021-09-07T15:57:26Z | - |
dc.date.created | 2021-06-14 | - |
dc.date.issued | 2011-01-31 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/113238 | - |
dc.description.abstract | At very low temperatures (<80 degrees C), improved performance indium tin oxide (ITO) thin films with a low resistivity of 4.22 x 10(-4) Omega cm and high transmittance >90% at 550 nm were developed using the neutral beam-assisted sputtering (NBAS) technique, which included a cyclic inter-treatment process with an Ar neutral beam. Transmission electron microscopy and electron diffraction showed that the neutral particles with hyper-thermal energy was able to enhance the formation of the nano-crystalline phase and activate the dopant without additional heating or plasma damage during ITO thin film deposition. (C) 2010 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | PULSED-LASER DEPOSITION | - |
dc.subject | THIN-FILMS | - |
dc.subject | OPTICAL-PROPERTIES | - |
dc.subject | METAL-SURFACES | - |
dc.subject | PLASMA | - |
dc.subject | IONS | - |
dc.title | Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Hong, MunPyo | - |
dc.identifier.doi | 10.1016/j.tsf.2010.10.041 | - |
dc.identifier.scopusid | 2-s2.0-78751646881 | - |
dc.identifier.wosid | 000287543300010 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.519, no.7, pp.2098 - 2102 | - |
dc.relation.isPartOf | THIN SOLID FILMS | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 519 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | 2098 | - |
dc.citation.endPage | 2102 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | PULSED-LASER DEPOSITION | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | OPTICAL-PROPERTIES | - |
dc.subject.keywordPlus | METAL-SURFACES | - |
dc.subject.keywordPlus | PLASMA | - |
dc.subject.keywordPlus | IONS | - |
dc.subject.keywordAuthor | Neutral beam assisted deposition | - |
dc.subject.keywordAuthor | Indium tin oxide | - |
dc.subject.keywordAuthor | Low temperature deposition | - |
dc.subject.keywordAuthor | Sputtering | - |
dc.subject.keywordAuthor | Nano crystalline | - |
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