Nano-Tribological Properties of Topographically Undulated Nanocrystalline Diamond Patterns

Abstract

Surface roughness-controlled nanocrystalline diamond film was fabricated as an undulated line and space pattern on a silicon oxide surface. To simulate a MEMS (Micro-/Electro-Mechanical System) and NEMS (Nano-/Electro-Mechanical System) patterned surface, 800 nm and 1 mu m wide lines with a 200 nm wide space pattern were prepared on the substrate using E-beam lithography and an ESAND (Electrostatic Self-assembly of Nano Diamond) seeding layer lift-off process. Through this process, an undulated pattern of a nanocrystalline CVD diamond successfully formed by a conventional micro crystalline diamond growth system. The roughness of the deposited surface was controlled by regulating the size of the seeding nanodiamond particles. Crushing of the nanodiamond aggregates and dispersion of the nanodiamond solution was performed in an attrition milling system. An AFM (Atomic Force Microscopy) probe was used for the wear test and surface profiling of nanocrystalline diamond coatings. 2-D friction coefficient mapping by LFM (Lateral Force Microscopy) scanning showed a low friction coefficient (<0.1) on the line-patterned diamond surface, and a higher friction coefficient (<0.3) on a narrow area adjacent to the undulated pattern edges. With prolonged LFM scanning, the high coefficient of friction was reduced to less than 0.1. The bonding status of the nanocrystalline diamond was analyzed with Raman spectroscopy.