Maskless optical microscope lithography system

Abstract

A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns. (C) 2009 American Institute of Physics. [doi: 10.1063/1.3266965]