Thickness controlled and smooth polycrystalline CVD diamond film deposition on SiO2 with electrostatic self assembly seeding process
- Authors
- Kim, J. H.; Lee, S. K.; Kwon, O. M.; Hong, S. I.; Lim, D. S.
- Issue Date
- 10월-2009
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Thickness control; Nano diamond; Electrostatic self assembly; Hot filament CVD
- Citation
- DIAMOND AND RELATED MATERIALS, v.18, no.10, pp.1218 - 1222
- Indexed
- SCIE
SCOPUS
- Journal Title
- DIAMOND AND RELATED MATERIALS
- Volume
- 18
- Number
- 10
- Start Page
- 1218
- End Page
- 1222
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/119222
- DOI
- 10.1016/j.diamond.2009.04.012
- ISSN
- 0925-9635
- Abstract
- Sub micrometer thick continuous CVD diamond film was synthesized on thermally grown SiO2 film employing the electrostatic self assembly seeding with nano-meter sized ultra dispersed diamond particles. Hot filament CVD system was used to deposit diamond film. Formation of mono-dispersed and mono-layered nano diamond seeding layer by well-known Electrostatic Self-Assembly method was effective to increase density and homogeneity of seeding particles. Because of high density of uniformed seeding particles, the nm controlled continuous CVD films with the surface roughness of less than 13 nm on silicon oxide without any mechanical damage were obtained. Linear growth rate with short incubation time was also observed. Depending on the film thickness, coloring effect was observed ranging from blue to yellow and orange. There was no visible fringe on the coated surface which affirms the good thickness uniformity. (C) 2009 Elsevier B.V. All rights reserved.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > Department of Mechanical Engineering > 1. Journal Articles
- College of Engineering > Department of Chemical and Biological Engineering > 1. Journal Articles
- College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.