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Secondary Electron Generation in Electron-beam-irradiated Solids: Resolution Limits to Nanolithography
- Authors
- Lee, Kyu Won; Yoon, S. M.; Lee, S. C.; Lee, W.; Kim, I. -M.; Lee, Cheol Eui; Kim, D. H.
- Issue Date
- 10월-2009
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Electron-beam nanolithography; Secondary electron generation; Monte Carlo simulation
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.55, no.4, pp.1720 - 1723
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 55
- Number
- 4
- Start Page
- 1720
- End Page
- 1723
- ISSN
- 0374-4884
- Abstract
- We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.
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