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Fabrication of roll imprint stamp for continuous UV roll imprinting process

Authors
Hwang, Seon-YongHong, Sung-HoonJung, Ho-YongLee, Heon
Issue Date
4월-2009
Publisher
ELSEVIER SCIENCE BV
Keywords
Roll-to-Roll imprint; Roll stamp; M-PDMS (Methacryloxypropyl terminated poly-dimethylsiloxanes); PVA (poly-vinyl alcohol); Nano imprint lithography
Citation
MICROELECTRONIC ENGINEERING, v.86, no.4-6, pp.642 - 645
Indexed
SCIE
SCOPUS
Journal Title
MICROELECTRONIC ENGINEERING
Volume
86
Number
4-6
Start Page
642
End Page
645
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/120365
DOI
10.1016/j.mee.2008.11.055
ISSN
0167-9317
Abstract
Recently, nano imprint lithography has been developed for mass production of nano-scale patterns on large-scale substrates. To achieve high throughput and cost reduction, roll-to-roll imprint lithography has been introduced. The roll-to-roll imprint is the suitable process for large area patterning, especially, flexible substrates for display devices. In this study, roll-to-roll imprint stamp is fabricated using polyvinyl alcohol (PVA) mold and UV curable poly-dimethylsiloxanes (PDMS) resin for continuous roll imprinting process. The PVA mold was chosen since it is flexible and can be dissolved in water. Since the PDMS can form thin SiOx layer on the surface by oxygen plasma treatment, silane based hydrophobic anti-stiction layer can be formed directly on the surface of PDMS. As a result, nano-sized patterns were successfully formed on the flexible PET films by UV roll imprinting with the fabricated roll stamp. (C) 2008 Elsevier B.V. All rights reserved.
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공과대학 (신소재공학부)
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