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Local-Gating Carbon-Nanotube Transistor with Poly-Si Bottom Gates

Authors
Song, WoonMoon, SunkyungLee, Soon-GulKim, Jinhee
Issue Date
4월-2009
Publisher
KOREAN PHYSICAL SOC
Keywords
Carbon nanotube; Carbon nanotube field-effect transistor; Local gate
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.54, no.4, pp.1742 - 1745
Indexed
SCIE
SCOPUS
KCI
Journal Title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume
54
Number
4
Start Page
1742
End Page
1745
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/120378
DOI
10.3938/jkps.54.1742
ISSN
0374-4884
Abstract
A carbon nanotube field-effect transistor (CNFET) over poly-Si local gates was fabricated. The highly-doped poly-Si local gates were fabricated on top of a SiO(2) layer and an individual single-wall carbon nanotube was grown over the ploy-Si gates by using chemical vapor deposition. The transport characteristics of the CNFETs were measured at low temperatures. The gate response showed typical p-type FET characteristics with both global back and local bottom gates. The gate coupling of the local gates were comparable to or even greater than that of the global back gate. By applying appropriate gate bias voltages, we could achieve complete depletion of the carriers in the conduction channel.
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College of Science and Technology > Semiconductor Physics in Division of Display and Semiconductor Physics > 1. Journal Articles

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